国立大学法人九州大学 応用力学研究所

English 所内限定 Search Sitemap Site Policy

イベント

  • Home
  • 研究活動
  • イベント
  • 2018 年度

イベント開催のご案内

[九大応力研 国際化推進共同利用研究] [ 講演会 ]
Thermodynamic considerations for light impurities removal from Silicon
 
日 時 2019 年 3 月 13 日(水) 16 時 00 分 ~ 17 時 30 分
場 所 九州大学応用力学研究所 西棟6階 W606 号室  * アクセス案内はこちら
 
題 目 Thermodynamic considerations for light impurities removal from Silicon
講演者 Dr. Guy CHICHIGNOUD
(Charge de Recherche CNRS, Laboratoire Science et d'Ingenierie des Materiaux et Procedes SIMaP/Elaboration par Procedes Magnetiques)
Abstract Ultra-Pure Silicon obtained through chemical route is clearly prevailing as feedstock material for Photovoltaics, apparently leaving the alternative metallurgical route of purification behind. Given the large amount of pure Silicon wasted during the wafer production and increasing number of decommissioned modules, those two routes will eventually be more complementary than in competition, as metallurgical steps of purification open new possibilities of recycling for Photovoltaics.
Nevertheless, the management of impurities and most specifically light impurities, is of prime importance for compatibility with industrial standards, while basic data can be lacking or inaccurate. Taking advantage of competences in Silicon metallurgy at Grenoble University, dedicated experiments and characterization of Silicon purification processes are developed to provide improved and optimized thermodynamic.
 
 
 

[問い合わせ]
自然エネルギー統合利用センター 新エネルギーシステム工学分野
西澤 伸一
 
 

PAGE TOP